Development of methods for formation and testing of photoresist films with a desired thickness profile when fabricating conformal correctors
V.P. Korolkov, A.S. Konchenko, V.V. Cherkashin, N.G. Mironnikov

 

Institute of Automation and Electrometry SB RAS, Novosibirsk, Russia

Full text of article: Russian language.

Abstract:
A process of manufacturing conformal correctors for solid state YAG:Nd3+ lasers is discussed. It is proposed that a maskless lithography method should be used for fabricating a photoresist film with a desired thickness profile as an alternative to the proximity lithography based on half-tone masks. The use of a specular spectral scatterometry method for the testing of the conformal corrector shape at an early stage of photoresist profile formation is reported. A combination of these two methods makes the corrector manufacturing process significantly cheaper and faster.

Keywords:
specular spectral scatterometry, maskless lithography, conformal correctors, thin film thickness measurement, profilometry.

Citation:
Korolkov VP, Konchenko AS, Cherkashin VV, Mironnikov NG. Development of methods for formation and testing of photoresist films with a desired thickness profile when fabricating conformal correctors. Computer Optics 2016; 40(4): 482-488. DOI: 10.18287/2412-6179-2016-40-4-482-488.

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