Development of methods for formation and testing of photoresist films with a desired thickness profile when fabricating conformal correctors
V.P. Korolkov, A.S. Konchenko, V.V. Cherkashin, N.G. Mironnikov
Institute of Automation and Electrometry SB RAS, Novosibirsk, Russia
Full text of article: Russian language.
A process of manufacturing conformal correctors for solid state YAG:Nd3+ lasers is discussed. It is proposed that a maskless lithography method should be used for fabricating a photoresist film with a desired thickness profile as an alternative to the proximity lithography based on half-tone masks. The use of a specular spectral scatterometry method for the testing of the conformal corrector shape at an early stage of photoresist profile formation is reported. A combination of these two methods makes the corrector manufacturing process significantly cheaper and faster.
specular spectral scatterometry, maskless lithography, conformal correctors, thin film thickness measurement, profilometry.
Korolkov VP, Konchenko AS, Cherkashin VV, Mironnikov NG. Development of methods for formation and testing of photoresist films with a desired thickness profile when fabricating conformal correctors. Computer Optics 2016; 40(4): 482-488. DOI: 10.18287/2412-6179-2016-40-4-482-488.
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